SKU:89556813771
Al2O3- Sapphire Wafer, C-plane (0001), 0.5"x0.5"x0.5mm, 2Sp - ALC121205S2
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USA
- USA
- CAN
- USA
- CAN
Ships within 48 hours · Estimated delivery Jul 15 - Jul 20
Description
Al2O3- Sapphire Wafer, C-plane (0001), 0.5"x0.5"x0.5mm, 2Sp - ALC121205S2Features: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 0. 5" x 0. 5" x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. C plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A 2 sides polished Package: Each wafer is packed in 1000 class clean room
please click here for specification details
Material Aluminum
Case Height: 100mm
06 @ 0 oC 25
5" diameter shaft
Please click the Pic1 & 2 for details
working temperature: 80oC
(Voltage-time curve
4MPa (the cap valve will open to release interior high pressure if over 2
630 MPa The Hi-Throughput Pressing Die Set includes 32 pieces 10mm ID pressing die:
Click below video to see how to weld the tab onto the current collector of the electrode:
Do not raise the bottom cylinder (piston) more than its maximum traveling distance
Quick Dispatch:
Your Al2O3- Sapphire Wafer, C-plane (0001), 0.5"x0.5"x0.5mm, 2Sp - ALC121205S2 orders ship within 1-2 business days.
Delivery Options:
- Standard: 3-7 business days
- Fast: 2-3 business days
- Express: 1-2 business days
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Exchange/Return Notes
- We offer a 30-day return/exchange service after receiving.
- Final sale items are not eligible for returns or exchanges.
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