Al2O3 - Sapphire Wafer, M plane, 0.5"x0.5"x0.5mm, 1 SP - ALM121205S1

Al2O3 - Sapphire Wafer, M plane, 0.5"x0.5"x0.5mm, 1 SP - ALM121205S1Fearures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 0. 5" x 0. 5" x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. M plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A 1 side polished Package: Each wafer is packed in 1000 class clean room with

58@ 300K at C axis

2015  The UL/CSA ready version is available

Operating Temperature 1200ºC Application Notes Vacuum pressures may only be safely used up to 1000°C

Ash ash Fe Cu

3  Pressure

Please use a quartz or alumina crucible to carry the sample

You may order an internal resistance tester to measure DC resistivity (click the second and third picture below for more information)

Detailed dimension drawing Warning Do NOT use an alumina tube under a vacuum at a temperature > 1500 °C

Standard Package

One steel sleeve for core die protection

Nanopowder

Dimensions: 14"(L) x 14"(W) x 14"(H)